Save the Date – RootsTech London is coming October 24-26, 2019!

RootsTech London will be held at the ExCeL London Convention Centre on the east side of London, five minutes from the London City Airport & 40 minutes from London’s Heathrow Airport on the new Elizabeth line.
 
 
[su_heading size=”20″]What Is It? [/su_heading]

RootsTech London is a first-time expansion of RootsTech. This conference is in addition to RootsTech 2019 being held in Salt Lake City, Utah on February 27 – March 2, 2019. This will be an English-language conference.

RootsTech London hopes to give more people the opportunity to experience RootsTech. You’ll gather with fellow family history enthusiasts and enjoy keynote speakers, entertainment, and 150 classes geared toward both Western genealogy and Eastern genealogy. Livestreaming is planned for this event and they’re considering a small fee to participate in an expanded list of livestream sessions for those who are unable to attend in person.
 
 
[su_heading size=”20″]Call for Presentations [/su_heading]

On October 22, 2018, RootsTech London will open their call for class proposals, including classes that address ancestral lands throughout the world.
 
 
[su_heading size=”20″]Registration Opens [/su_heading]

Registration for RootsTech London will open February 27, 2019, after the keynote speaker address at RootsTech in SLC. If you have questions or comments, please address them to info@rootstech.org.
 
 
[su_heading size=”20″]Sign Up for Exclusive Deals and Updates on RootsTech London [/su_heading]

Visit www.rootstech.org/london for more information and enter your name and email address to receive updates and offers for this new conference.

And don’t forget to Save the Date!

Here’s a pinnable image to save for future reference and please follow the OnGenealogy Pinterest Board, What’s New in Genealogy for the latest news.

RootsTech London October 22-24, 2019 Sign Up for updates and offers

 

Leave a Reply

This site uses Akismet to reduce spam. Learn how your comment data is processed.